(Telecom-NewsWire.Net, June 13, 2018 ) Photomask is one of the most extensively used technologies for micro fabrication industries. Photomask is fabricated with lithographic process. It provides high throughput with high-yield processing. Photomask is chrome coated glass lithographic aimed to transfer patterns to other substrates. Photomask contain glass substrate coated with opaque film, fused silica which gives an accurate replication of device. Photomask can replicate thousands of circuit and pattern. While creating a chrome pattern in the Photomask process photolithography technique is employed and then the Photomask is used as photographic plates for LCD, PCB, and LSI etc. Photomask is used in electronic devices such as CPU, memory (semiconductor/ IC), light receiving/ emitting elements - CCD/CMOS image sensors, LED, display device, micro electrical mechanical system (MEMS) and magnetic head for hard disk. Growing automation and electronic industry has witnessed major progress over a period. Photomask market is expected to reach US$ 4,949.1 million by 2025 from US$ 3,320.0 million in 2015. Semiconductor & IC application is expected to continue its dominance.
One of the major driving factor fueling the growth of Photomask is increasing demand for high chip density. Density of chip refers to number of transistor assembled into single chip. High density chip has many transistor which empowers to perform at higher functionality. The increasing demand for SoC which result in increasing the need for high-density chip. In addition to this there are other factors driving the market such as growth of FPD market, increasing usage of flat panel display such as TVs, cell phones, PCs and others. Growing demand for large screen electronic devices is fueling the growth of Photomask and increasing demand for system-on-chip (SoC) technology. Robotics helps in development of IoT and semiconductor and electronic system and rising demand for smart homes, smart building, and smart infrastructure is expected to boost the market for Photomask over coming years.
The photomask market report focuses on an in-depth segmentation of this market based by type, application and end-user verticals. The geographic segmentation of the report covers six major regions including; North Americas, Europe, Asia-Pacific (APAC), Middle East and Africa (MEA) and South America (SA). The regional market has been further bifurcated by respective countries. By end-user vertical semiconductor & IC sector accounted for the largest share of the photomask market in 2016; whereas, APAC region is expected to grow at the highest CAGR during the forecast period.
The photomask market report aims to provide an overview of global photomask market with detailed market segmentation. Also, it analyzes the current photomask market scenario and forecasts the photomask market till 2025. The report covers market dynamics effecting the market during the forecast period. Furthermore, the report analyzes the competitive scenario, geographic trends, and opportunities in the markets with respect to all geographic regions. The report also includes the detailed company profiles of the key players in the market along with their market strategies. The report also provides PEST analysis and SWOT analysis for all company profiled in the report.
Asia Pacific is one of the prominent regions in photomask market which will contribute highest revenue globally due to the presence of some of the world’s largest semiconductor and display fabrication units along with considerable implementation of photomask technology in different application segment. Rapidly growing economies in Asia-Pacific (APAC) with significant growth in IT sector will pave the path for increasing adoption and propel the market for photomask. The region is expected to lead the market with highest CAGR during the forecast period.
Photomask Market Key Players
1. Advance Reproductions Corporation
2. Compugraphics International Limited Brugg Group
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